scientific output

Researcher ID: G-9630-2011

ORCID: 0000-0001-8207-3825

Selected talks

[Invited Talk] Linking surface kinetics, microstructure, and conformality: early steps towards predictive synthesis in ALD and CVD, Joint EuroCVD 21 - Baltic ALD 15, Linkoping, Sweden (2017)

[Panelist] Building to last: challenges in additive manufacturing going from prototype to functional component. Roadmap Workshop on Measurement Science for Polymer-Based Additive Manufacturing, Gaithersburg, USA (2016)

[Invited talk] Growth under the influence of chemistry: the emergence of microstructure and metastable phases far from equilibrium, Fall 2015 Prairie Section Meeting, Notre Dame (2015)

[Invited talk] From Atom to Solid: The Structure of Amorphous ALD Thin Films and Nanolaminates, AVS 62nd International Symposium & Exhibition, San Jose (2015)

[Invited talk] Analytic solution to the problem of ALD growth in cross-flow reactors: surface coverage, saturation curves, and scale up, 13th International Conference on Atomic Layer Deposition, San Diego (2013)

[Invited talk] In-situ FTIR characterization of growth inhibition in Atomic Layer Deposition using reversible surface functionalization, Pacific Rim Meeting on Electrochemical and Solid-State Science, Honolulu, Hawaii (2012).

[Featured talk] In-situ FTIR characterization of growth inhibition in Atomic Layer Deposition using reversible surface functionalization, 12th International Conference on Atomic Layer Deposition, Dresden, Germany (2012).

Book chapters

A. Yanguas-Gil and H. Woormester, Relationship between Surface Morphology and Effective Medium Roughness, in Ellipsometry at the Nanoscale, M. Losurdo and K. Hingerl, eds. Springer-Verlag (2013).

Patents

  1. Surface preparation for thin film growth by enhanced nucleation, US Patent 7,943,527.
  2. Doping control by ALD surface functionalization, US Patent 8,951,615.

Selected articles

  • An instrument for in situ coherent x-ray studies of metal-organic vapor phase epitaxy of III-nitrides

    Guangxu Ju, Matthew J. Highland, Angel Yanguas-Gil, Carol Thompson, Jeffrey A. Eastman, Hua Zhou, Sean M. Brennan, G. Brian Stephenson, and Paul H. Fuoss, R. Sci. Instr. 88, 035113 (2017) [Link]

  • Infiltrated Zinc Oxide in polymethylmethacrylate: an atomic cycle growth study

    L. Ocola, A. Connolly, D. Gosztola, R. D. Schaller, and A. Yanguas-Gil, J. Phys. Chem. C 121, 1893 (2017) [Link]

  • W:Al2O3 Nanocomposite thin films with tunable optical properties prepared by atomic layer deposition

    S. Babar, A. U. Mane, A. Yanguas-Gil, E. Mohimi, R. T. Haasch, and J. W. Elam, J. Phys. Chem. C 120, 14681 (2016). [Link]

  • CoFe2/Al2O3/PMNPT multiferroic heterostructures by atomic layer deposition

    Z. Zhou, G. Grocke, A.Yanguas-Gil, X. Wang, Y. Gao, N. Sun, B. Howe and X. Chen, Journal of Applied Physics 108, 182907 (2016). [Link]

  • A modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes

    J. A. Klug, M. S. Weimer, J. D. Emery, A. Yanguas-Gil, S. Seifert, C. M. Schlepütz, A. B. F. Martinson, J. W. Elam, A. S. Hock, and T. Proslier, Review of Scientific Instruments 86, 112901 (2015). [Link]

  • Analytic expressions for atomic layer deposition: Coverage, throughput, and materials utilization in cross-flow, particle coating, and spatial atomic layer deposition

    A. Yanguas-Gil and J. W. Elam, Journal of Vacuum Science and Technology A 32, 031504 (2014). [Link]

  • A Markov Chain approach to simulate Atomic Layer Deposition chemistry and transport inside nanostructured features

    A. Yanguas-Gil and J. W. Elam, Theoretical Chemistry Accounts 133, 1465 (2014). [Link]

  • Modulation of the growth per cycle in atomic layer deposition using reversible surface functionalization

    A. Yanguas-Gil, J. Libera, and J. W. Elam, Chemistry of Materials 25, 4849 (2013). [Link]

  • Highly conformal magnesium oxide thin films by low temperature chemical vapor deposition from Mg(H3BNMe2BH3)2 and water

    W. B. Wang, Y. Yang, A. Yanguas-Gil, N. N. Chang, G. S. Girolami, and J. R. Abelson, Applied Physics Letters 102, 101605 (2013). [Link]

  • Hard HfB2 tip-coatings for ultrahigh density probe-based storage

    N. Tayebi, A. Yanguas-Gil, N. Kumar, Y. Zhang, J. R. Abelson, Y. Nishi, Q. Ma, and V. R. Rao, Applied Physics Letters 101, 091909 (2012). [Link]

  • Self-limited reaction-diffusion in nanostructured substrates: surface coverage dynamics and analytic approximations to ALD saturation times

    A. Yanguas-Gil and J. W. Elam, Chemical Vapor Deposition 18, 46 (2012). [Link]

  • Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor

    A. Yanguas-Gil and J. W. Elam, Journal of Vacuum Science and Technology A 80, 01A159 (2012). [Link]

  • Controlled dopant distribution and higher doping efficiencies by surface-functionalized atomic layer deposition

    A. Yanguas-Gil, K. E. Peterson and J. W. Elam, Chemistry of Materials 23, 4295 (2011). [Link]

  • Theory of light scattering from self-affine surfaces: Relationship between surface morphology and effective medium roughness

    A. Yanguas-Gil, B. A. Sperling and J. R. Abelson, Physical Review B 84 (8), 085402 (2011). [Link]

  • Inactivation of Bacteria and Biomolecules by Low-Pressure Plasma Discharges

    A. von Keudell, P. Awakowicz, J. Benedikt, V. Raballand, A. Yanguas-Gil, et al., Plasma Processes and Polymers 7 (3-4), 327 (2010). [Link]

  • Highly conformal film growth by chemical vapor deposition. I. A conformal zone diagram based on kinetics

    A. Yanguas-Gil, Y. Yang, N. Kumar and J. R. Abelson, Journal of Vacuum Science & Technology A 27 (5), 1235 (2009). [Link]

  • Highly conformal film growth by chemical vapor deposition. II. Conformality enhancement through growth inhibition

    A. Yanguas-Gil, N. Kumar, Y. Yang and J. R. Abelson, Journal of Vacuum Science & Technology A 27 (5), 1244 (2009). [Link]

  • Remote plasma treatment of Si surfaces: Enhanced nucleation in low-temperature chemical vapor deposition

    N. Kumar, A. Yanguas-Gil, S. R. Daly, G. S. Girolami and J. R. Abelson, Applied Physics Letters 95 (14), 144107 (2009). [Link]

  • A robust method to measure metastable and resonant state densities from emission spectra in argon and argon-diluted low pressure plasmas

    M. Schulze, A. Yanguas-Gil, A. von Keudell and P. Awakowicz, Journal of Physics D-Applied Physics 41 (6), 065206 (2008). [Link]

  • Growth Inhibition to Enhance Conformal Coverage in Thin Film Chemical Vapor Deposition

    N. Kumar, A. Yanguas-Gil, S. R. Daly, G. S. Girolami and J. R. Abelson, Journal of the American Chemical Society 130 (52), 17660 (2008). [Link]

  • Optical and electrical characterization of an atmospheric pressure microplasma jet for Ar/CH4 and Ar/C2H2 mixtures

    A. Yanguas-Gil, K. Focke, J. Benedikt and A. von Keudell, Journal of Applied Physics 101 (10), 103307 (2007). [Link]

  • Scaling behavior and mechanism of formation of SiO2 thin films grown by plasma-enhanced chemical vapor deposition

    A. Yanguas-Gil, J. Cotrino, A. Walkiewicz-Pietrzykowska and A. R. Gonzalez-Elipe, Physical Review B 76 (7), 075314 (2007). [Link]

  • Global model of a low pressure ECR microwave plasma applied to the PECVD of SiO2 thin films

    A. Yanguas-Gil, J. Cotrino and A. R. Gonzalez-Elipe, Journal of Physics D-Applied Physics 40 (11), 3411 (2007). [Link]

  • First nucleation steps during deposition of SiO2 thin films by plasma enhanced chemical vapour deposition

    D. Dudeck, A. Yanguas-Gil, F. Yubero, J. Cotrino, J. P. Espinos, W. de la Cruz and A. R. Gonzalez-Elipe, Surface Science 601 (10), 2223 (2007). [Link]

  • SiK-edge XANES study of SiOxCyHz amorphous polymeric materials

    J. Chaboy, A. Barranco, A. Yanguas-Gil, F. Yubero and A. R. Gonzalez-Elipe, Physical Review B 75 (7), 075205 (2007). [Link]

  • Relationship between scaling behavior and porosity of plasma-deposited TiO2 thin films

    A. Borras, A. Yanguas-Gil, A. Barranco, J. Cotrino and A. R. Gonzalez-Elipe, Physical Review B 76 (23), 235303 (2007). [Link]

  • Measuring the electron temperature by optical emission spectroscopy in two temperature plasmas at atmospheric pressure: A critical approach

    A. Yanguas-Gil, J. Cotrino and A. R. Gonzalez-Elipe, Journal of Applied Physics 99 (3), 033104 (2006). [Link]

  • Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films

    A. Yanguas-Gil, J. Cotrino, A. Barranco and A. R. Gonzalez-Elipe, Physical Review Letters 96 (23), 236101 (2006). [Link]

  • Plasma characterization of oxygen-tetramethylsilane mixtures for the plasma-enhanced CVD of SiOxCyHz thin films

    A. Yanguas-Gil, A. Barranco, J. Cotrino, P. Groning and A. R. Gonzalez-Elipe, Chemical Vapor Deposition 12 (12), 728 (2006). [Link]

  • Atmospheric pressure microplasma jet as a depositing tool

    J. Benedikt, K. Focke, A. Yanguas-Gil and A. von Keudell, Applied Physics Letters 89 (25), 251504 (2006). [Link]

  • Analysis of SiOxCyHz polymeric materials by x-ray absorption spectroscopy: Anomalous behavior of the resonant SiKLL Auger spectra

    A. Barranco, A. Yanguas-Gil, F. Yubero and A. R. Gonzalez-Elipe, Journal of Applied Physics 100 (3), 033706 (2006). [Link]

  • Influence of the excited states on the electron-energy distribution function in low-pressure microwave argon plasmas

    A. Yanguas-Gil, J. Cotrino and A. R. Gonzalez-Elipe, Physical Review E 72 (1), 016401 (2005). [Link]

  • An update of argon inelastic cross sections for plasma discharges

    A. Yanguas-Gil, J. Cotrino and L. L. Alves, Journal of Physics D-Applied Physics 38 (10), 1588 (2005). [Link]

  • Reforming of ethanol in a microwave surface-wave plasma discharge

    A. Yanguas-Gil, J. L. Hueso, J. Cotrino, A. Caballero and A. R. Gonzalez-Elipe, Applied Physics Letters 85 (18), 4004 (2004). [Link]

  • Collisional radiative model of an argon atmospheric capillary surface-wave discharge

    A. Yanguas-Gil, J. Cotrino and A. R. Gonzalez-Elipe, Physics of Plasmas 11 (12), 5497 (2004). [Link]